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[¿µ¹®ÀÚ±â¼Ò°³¼­] ¹ý·ü ¹ý¹« ƯÇã 960 / 1216room 729-24 Bongcheon-dong Gwanak-gu S.KOREA TEL : +82-2-835-4993 Christine LITIGATION ¹®¼­¼­½ÄÆ÷Å»ºñÁîÆû Successfully conducted depositions and trials in a variety of media and commercial cases. Achieved favorable resolution of complex, difficult-to-win cases through meticulous work and deployment of group-su¡¦
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LGµð½ºÇ÷¹ÀÌ °øÁ¤°³¹ß ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­)

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¡¥½ºÅæ ¼³°è-A+/A+, °øÁ¤ °æÇè - Aerosol Deposition Àåºñ·Î ±¤ ÇÊÅÍ ¿ªÇÒÀ» ÇÏ´Â Multi layer¸¦ ÁõÂø - È­Çаú, ¼ÒÇÁÆ®¿þ¾îÇаú¿Í Çù¾÷ÇÏ¿© Å×Ç÷РÄÚÆðú ½Ã¹Ä·¹ÀÌ¼Ç ÇÁ·Î±×·¥À» ÀÇ·Ú - µ¥ÀÌÅÍ Á¾ÇÕ, Á¤¸® ¹× ºÐ¼®°ú ȸÀÇ·Ï ÀÛ¼º ¿ªÇÒÀ» ´ã´ç - Alpha step, UV-VIS Spectrometer, SEM µî ÃøÁ¤Àåºñ¸¦ »ç¿ëÇÏ¿© Ç¥¸é°ú ±¤ÇÐÀû Ư¼ºÀ» ºÐ¼® - ¿¡Äª ¹®Á¦¸¦ ÇØ°áÇÏ´Â °úÁ¤À» ¹ßÇ¥ÇÏ¿© Çѱ¹Àü¡¦
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[¿µ¹®ÀÚ±â¼Ò°³¼­] ¹ý·ü ¹ý¹« ƯÇã 966

[¿µ¹®ÀÚ±â¼Ò°³¼­] ¹ý·ü ¹ý¹« ƯÇã 966

[¿µ¹®ÀÚ±â¼Ò°³¼­] ¹ý·ü ¹ý¹« ƯÇã 966 / 1216room 729-24 Bongcheon-dong Gwanak-gu S.KOREA TEL : +82-2-835-4993 Christine OBJECTIVE ¹®¼­¼­½ÄÆ÷Å»ºñÁîÆû Position as a paralegal. EXPERIENCE ¹®¼­¼­½ÄÆ÷Å»ºñÁîÆû ¡Û¡Û¡Û , San Francisco, CA Paralegal, January 1997 to Present Responsibilities included organization of office work schedule and various financial a¡¦
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LIG³Ø½º¿ø °øÁ¤±â¼ú ÀÚ¼Ò¼­

LIG³Ø½º¿ø °øÁ¤±â¼ú ÀÚ¼Ò¼­

¡¥ ´ëÇÐ ½ÃÀý, Àú´Â CVD(Chemical Vapor Deposition) °øÁ¤ÀÇ È¿À²¼ºÀ» ±Ø´ëÈ­Çϱâ À§ÇÑ ¿¬±¸ ÇÁ·ÎÁ§Æ®¿¡ Âü¿©Çß½À´Ï´Ù. ÀÌ °úÁ¤¿¡¼­, ÀúÈñ ÆÀÀº CVD ÀåºñÀÇ Chamber ³»¿¡¼­ ¹ß»ýÇÑ ¿¹»óÄ¡ ¸øÇÑ Áø°ø ¼º´É ÀúÇÏ ¹®Á¦¿¡ Á÷¸éÇß½À´Ï´Ù. ÀÌ ¹®Á¦´Â ... 2.ŸÀÎÀÇ Çù·ÂÀ» À̲ø¾î ³»°Å³ª ŸÀÎÀ» ÁÖµµÀûÀ¸·Î µµ¿Í¼­ °øµ¿ÀÇ ¸ñÇ¥¸¦ ´Þ¼ºÇß´ø °æÇèÀ» ¼­¼úÇØÁÖ¼¼¿ä. [ÆÀ¿öÅ©¿Í Çõ½ÅÀ¸·Î ÀÌ·é, °øÁ¤¡¦
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¿øÀ;ÆÀÌÇÇ¿¡½º ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­)

¿øÀ;ÆÀÌÇÇ¿¡½º ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­)

¿øÀ;ÆÀÌÇÇ¿¡½º ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­) / º»ÀÎÀÌ ÇØ´ç ¾÷¹«¸¦ Áö¿øÇÑ ÀÌÀ¯¿Í Áö¿ø Á÷¹«¸¦ À§ÇØ Çß´ø ³ë·Â¿¡ ´ëÇؼ­ ¼­¼úÇØ ÁÖ¼¼¿ä. "°áÇÔ°ú °á°ú¸¦ ¾Æ´Â »ç¶÷, ÁغñµÈ CS Engineer" ÀåºñÀÇ ´Ü ÇϳªÀÇ °áÇÔÀÌ °øÁ¤¿¡´Â Ä¡¸íÀûÀÏ ¼ö ÀÖ½À´Ï´Ù. ÀÌ ¶§¹®¿¡ CS Engineer´Â ÀåºñÀÇ °áÇÔ¿¡ µû¶ó ¹ß»ýÇÏ´Â °øÁ¤ÀÇ À̽´¸¦ ÆľÇÇÒ ¼ö ÀÖ¾î¾ß ÇÕ´Ï´Ù. ¾Æ½¬¿îÁ¡ 1ÀÌ·¯ÇÑ CS·Î¼­ÀÇ ¿ª·®À» Å°¡¦
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µµÄìÀÏ·ºÆ®·Ð ÄÚ¸®¾Æ Process Engineer-Etching ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­)

µµÄìÀÏ·ºÆ®·Ð ÄÚ¸®¾Æ Process Engineer-Etching ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­)

µµÄìÀÏ·ºÆ®·Ð ÄÚ¸®¾Æ Process Engineer-Etching ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­) / 1. µµÄìÀÏ·ºÆ®·ÐÄÚ¸®¾Æ¿¡ Áö¿øÇÏ°Ô µÈ °è±â¿Í Áö¿øÇϽŠÁ÷¹«¿¡ ´ëÇÑ »ý°¢À» ±â¼úÇØÁֽñ⠹ٶø´Ï´Ù. (ÃÖ¼Ò 100ÀÚ, ÃÖ´ë 500ÀÚ ÀԷ°¡´É) [°í¼º´É Àåºñ¿Í etchingÀÇ Á߿伺] ¹ÝµµÃ¼ Á¦Á¶¿¡¼­ Áß¿äÇÑ ¿ä¼Ò·Î ¼ÒÀç, ºÎÇ°, Àåºñ¸¦ ¸»ÇÕ´Ï´Ù. ¹ÝµµÃ¼°¡ 5³ª³ë ÀÌÇÏ·Î ÀÛ¾ÆÁö¸é¼­ ¹Ì¼¼ÇÑ °øÁ¤ÀÌ ÇÊ¿äÇÏ°Ô µÇ¾ú°í¡¦
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µµÄìÀÏ·ºÆ®·ÐÄÚ¸®¾Æ ½Ã¼³°ü¸®Á÷ ÃÖÁ¾ ÇÕ°Ý ÀÚ±â¼Ò°³¼­(ÀÚ¼Ò¼­)

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¡¥Áß¿äÇÔÀ» ¹è¿ï ¼ö ÀÖ¾ú°í µµÄìÀÏ·ºÆ®·ÐÄÚ¸®¾Æ´Â Etch Deposition Cleaning °øÁ¤ ÀåºñÀÇ ¼­ºñ½º Á¦°øÀ¸·Î ±× ÀÌÀ¯¸¦ Á¦½ÃÇØÁÖ°í ÀÖ½À´Ï´Ù. °í°´»ç¿¡°Ô Áö¼ÓÀûÀ¸·Î CS¸¦ Á¦°øÇϱâ À§ÇØ ¾ÈÁ¤ÀûÀÎ ÀÎÇÁ¶ó ¿î¿µÀÌ Áß¿äÇÏ´Ù »ý°¢ÇÕ´Ï´Ù. ¶ÇÇÑ Ç×»ó ¹î±æÀ» ¹à°Ô ºñÃß´Â µî´ë¿Í °°ÀÌ Ã¼°èÀûÀ¸·Î Àü±â¼³ºñ¸¦ ¿î¿µ °ø»ç¸¦ °èȹÇÏ´Â °ÍÀÌ ½Ã¼³°ü¸® Á÷¹«ÀÌ°í Á÷¹«¿¡ ÀÖ¾î ½Å·Ú°¡ Áß¿äÇÏ´Ù »ý°¢ÇÕ´Ï´Ù¡¦
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