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1.3. Interactions on the target surface
媛��냽�맂 �뼇�씠�삩�씠 怨좎껜�몴硫댁뿉 異⑸룎�븯硫� 以묒꽦�썝�옄 諛곗텧, �썑諛⑹궛���, X�꽑 諛⑹텧, 愿묒옄 諛쒖깮, �씠李� �쟾�옄 諛⑹텧, 洹몃━怨� target �몴硫댁뿉�꽌 湲곗껜�썝�옄�쓽 �깉李� �벑�씠 諛쒖깮�븯硫�, target�뿉�꽌�뒗 鍮꾩젙吏덊솕, �씠�삩移⑦닾, �솕�빀臾� �삎�꽦, cascade 諛쒖깮, 援�遺��쟻 媛��뿴, �젏寃고븿�씠 �깮�꽦�맂�떎.
�뵆�씪利덈쭏瑜� �쑀吏��븯�뒗�뜲 媛��옣 以묒슂�븳 �뿭�븷�쓣 �븯�뒗 寃껋�� �씠李� �쟾�옄�씠�떎. �뵆�씪利덈쭏 �궡�뿉�꽌 �씠李� �쟾�옄�뒗 異붽���쟻�씤 �씠�삩�솕瑜� �씪�쑝�궎怨� �뵆�씪利덈쭏�쓽 愿묓븰�쟻 諛쒖궛�쓽 color, intensity�뒗 target �옱猷�, gas�쓽 醫�, �븬�젰, excitation �벑�쓽 �듅吏뺤쑝濡�, discharge �궡�쓽 援ъ꽦�슂�냼�뱾�쓽 議댁옱�뒗 �듅�꽦 �뒪�럺�듃�읆 �뙆�옣�쓽 議곗궗濡� �븣 �닔 �엳�떎.
1.4. Sputtering yield
`�븯�굹�쓽 �뼇�씠�삩�씠 �쓬洹뱀뿉 異⑸룎�븷 �븣 �몴硫댁뿉�꽌 諛⑹텧�릺�뒗 �썝�옄�쓽 �닔��쒕줈 �젙�쓽�릺硫�, �씠�뒗 target �옱猷뚯쓽 �듅�꽦 諛� �엯�궗 �씠�삩�쓽 �뿉�꼫吏���� 吏덈웾怨� 愿�怨꾧�� �엳�떎.
- �뼇�씠�삩�쓽 媛��냽 �쟾�븬
쨌V媛� 利앷���븯硫� S�룄 利앷��
쨌V媛� 留ㅼ슦 �겕硫� S�뒗 �뿭�쑝濡� 媛먯냼(�댌 媛��냽�맂 �뼇�씠�삩�씠 target �궡遺�濡� 源딆씠 諛뺥옒)
1.5. Target consideration
쨌媛��냽�맂 �씠�삩�씠 媛�吏�怨� �엳�뒗 �뿉�꼫吏���� �슫�룞�웾�쓽 �쟾�씠, 異⑸룎濡� �씤�븳 媛��뿴, 媛��뿴�뿉 �쓽�븳 �뼱�땺留�, �씠�삩�씠�굹 �썝�옄�쓽 �솗�궛�뿉 �쓽�빐 sputtering 諛섏쓳�씠 吏�諛곕컺�뒗�떎. �씠�윭�븳 吏�諛곗슂�냼媛� target�쓽 �떎�젣�쟻�씤 �궗�슜�쓣 �젣�븳�븯湲곕룄 �븳�떎.
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Sputter Deposition.hwp
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